Metals and Molecules on an Insulating Surface: First Steps towards an Atomically Defined Molecular Device

In order to avoid leakage currents, we are using an atomically flat insulating substrate. This poses additional challenges, as (1) there are few tools which enable measurements on insulating surfaces, and consequently, (2) there is little known about the growth of metals and molecules on insulators. We are using ultrahigh vacuum noncontact atomic force microscopy (NC-AFM) to examine some of the basic surface science which will lay the foundation for assembling an atomically defined molecular device on an insulator. NC-AFM, largely developed in the last few years, is unique in its ability to measure surface structure with atomic resolution on insulators [2]. It is expected that this technique will broadly expand our understanding of insulating surfaces, and provide a means for nanoscale manipulation, as STM does for metals and semiconductors.